TEM Studies of Cu₂O-Si and Cu₂O-InP Interfaces Made by Epitaxial Electrodeposition

Fumiyasu Oba; Run Liu; Y. Yu; Eric W. Bohannan; Frank Ernst; Jay A. Switzer

doi:10.1017/S1431927604884617

TEM Studies of Cu₂O-Si and Cu₂O-InP Interfaces Made by Epitaxial Electrodeposition

Fumiyasu Oba
, Run Liu
, Y. Yu
, Eric W. Bohannan
, Frank Ernst
, Jay A. Switzer

Research output: Contribution to journal › Article › peer-review

Original language	American English
Pages (from-to)	292-293
Number of pages	2
Journal	Microscopy and Microanalysis
Volume	10
Issue number	SUPPL. 2
DOIs	https://doi.org/10.1017/S1431927604884617
State	Published - Jan 1 2004

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Chemistry

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10.1017/S1431927604884617License: CC BY

https://doi.org/10.1017/S1431927604884617

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title = "TEM Studies of Cu₂O-Si and Cu₂O-InP Interfaces Made by Epitaxial Electrodeposition",

author = "Fumiyasu Oba and Run Liu and Y. Yu and Bohannan, \{Eric W.\} and Frank Ernst and Switzer, \{Jay A.\}",

year = "2004",

month = jan,

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doi = "10.1017/S1431927604884617",

language = "American English",

volume = "10",

pages = "292--293",

journal = "Microscopy and Microanalysis",

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TY - JOUR

T1 - TEM Studies of Cu₂O-Si and Cu₂O-InP Interfaces Made by Epitaxial Electrodeposition

AU - Oba, Fumiyasu

AU - Liu, Run

AU - Yu, Y.

AU - Bohannan, Eric W.

AU - Ernst, Frank

AU - Switzer, Jay A.

PY - 2004/1/1

Y1 - 2004/1/1

UR - https://scholarsmine.mst.edu/chem_facwork/525

UR - https://doi.org/10.1017/S1431927604884617

U2 - 10.1017/S1431927604884617

DO - 10.1017/S1431927604884617

M3 - Article

SN - 1435-8115

VL - 10

SP - 292

EP - 293

JO - Microscopy and Microanalysis

JF - Microscopy and Microanalysis

IS - SUPPL. 2

ER -

TEM Studies of Cu₂O-Si and Cu₂O-InP Interfaces Made by Epitaxial Electrodeposition

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