Probing surface and bulk chemistry in resist films using near edge x-ray absorption fine structure

Joseph L. Lenhart; Ronald L. Jones; Eric K. Lin; Christopher L. Soles; Wen Li Wu; Daniel A. Fischer; Sharadha Sambasivan; Dario L. Goldfarb; Marie Angelopoulos

doi:10.1116/1.1524970

Probing surface and bulk chemistry in resist films using near edge x-ray absorption fine structure

Joseph L. Lenhart
, Ronald L. Jones
, Eric K. Lin
, Christopher L. Soles
, Wen Li Wu
, Daniel A. Fischer
, Sharadha Sambasivan
, Dario L. Goldfarb
, Marie Angelopoulos

National Institute of Standards and Technology
IBM

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	2920-2926
Number of pages	7
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	20
Issue number	6
DOIs	https://doi.org/10.1116/1.1524970
State	Published - Nov 2002
Externally published	Yes

ASJC Scopus Subject Areas

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.1524970

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Lenhart, J. L., Jones, R. L., Lin, E. K., Soles, C. L., Wu, W. L., Fischer, D. A., Sambasivan, S., Goldfarb, D. L., & Angelopoulos, M. (2002). Probing surface and bulk chemistry in resist films using near edge x-ray absorption fine structure. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 20(6), 2920-2926. https://doi.org/10.1116/1.1524970

Lenhart, JL, Jones, RL, Lin, EK, Soles, CL, Wu, WL, Fischer, DA, Sambasivan, S, Goldfarb, DL & Angelopoulos, M 2002, 'Probing surface and bulk chemistry in resist films using near edge x-ray absorption fine structure', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 20, no. 6, pp. 2920-2926. https://doi.org/10.1116/1.1524970

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AU - Lenhart, Joseph L.

AU - Jones, Ronald L.

AU - Lin, Eric K.

AU - Soles, Christopher L.

AU - Wu, Wen Li

AU - Fischer, Daniel A.

AU - Sambasivan, Sharadha

AU - Goldfarb, Dario L.

AU - Angelopoulos, Marie

PY - 2002/11

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SN - 0734-211X

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JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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Probing surface and bulk chemistry in resist films using near edge x-ray absorption fine structure

ASJC Scopus Subject Areas

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