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Preliminary evidence of field induced rhenium etching by Xe F2 at high vacuum

  • Missouri University of Science and Technology

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Article number044901
JournalJournal of Applied Physics
Volume103
Issue number4
DOIs
StatePublished - 2008

ASJC Scopus Subject Areas

  • General Physics and Astronomy

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