Skip to main navigation Skip to search Skip to main content

Influence of temperature, oxygen partial pressure, and microstructure on the high-temperature oxidation behavior of the SiC Layer of TRISO particles

  • Visharad Jalan
  • , Adam Bratten
  • , Meng Shi
  • , Tyler Gerczak
  • , Haiyan Zhao
  • , Jonathan D. Poplawsky
  • , Xiaoqing He
  • , Grant Helmreich
  • , Haiming Wen
  • Missouri University of Science and Technology
  • University of Idaho
  • Oak Ridge National Laboratory
  • University of Missouri
  • University of Missouri-Columbia

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Article number116913
JournalJournal of the European Ceramic Society
Volume45
Issue number2
DOIs
StatePublished - Jan 2025
Externally publishedYes

ASJC Scopus Subject Areas

  • Ceramics and Composites
  • Materials Chemistry

Keywords

  • Atom probe tomography
  • Electron microscopy
  • Oxidation
  • Silicon carbide
  • TRISO particle

Fingerprint

Dive into the research topics of 'Influence of temperature, oxygen partial pressure, and microstructure on the high-temperature oxidation behavior of the SiC Layer of TRISO particles'. Together they form a unique fingerprint.

Cite this