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Electrodeposition of Nanomodulated Electronic Ceramic Thin Films

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Abstract

Electrochemistry can be used for the atomic-level architecture of ceramic materials. In this report, ceramic superlattices based on the Tl a Pb b O c /Tl d Pb e O f system were electrodeposited with individual layer thicknesses as thin as 3 nm. The superlattices were deposited from a single aqueous solution at room temperature, and the layer thicknesses were galvanostatically controlled. Substitution of Tl 2 O 3 into PbO 2 appears to stabilize a face-centered cubic structure with an average lattice parameter of 0.536 nm. The lattice parameters for the Tl a Pb b O c mixed oxides vary by less than 0.3% when the Pb/Tl ratio is varied from 0.84 to 7.3. Because the modulation wavelengths are of electron mean free path dimensions, this new class of degenerate semiconductor metal-oxide superlattices may show thickness-dependent quantum optical, electronic, or optoelectronic effects.

Original languageAmerican English
JournalNational Institute of Standards and Technology (NIST) Special Publication 804
StatePublished - Jan 1 1991

Keywords

  • Ceramic Materials
  • Electrodeposition
  • Metal Oxide Superlattices
  • Modulated Structures
  • Nanomodulated Electronic Ceramic Films
  • Oxides - Mixing
  • Semiconductor Materials - Optical Properties

Disciplines

  • Chemistry

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